Apparent Activation Energy of Titanium in Hydrofluoric Acid
نویسندگان
چکیده
منابع مشابه
Surface Characterization of Titanium Implants Treated in Hydrofluoric Acid
The results of XPS measurements of commercially pure titanium (cp-Ti) before and after chemical treatment are presented. We have measured XPS spectra of core levels (Ti 2p, O 1s, C 1s, F 1s) and valence bands of coarse-grained cp-Ti before and after standard acid treatment accepted in dentistry (in 1% HF and 40% HF for 1 min). It is found, that acid treatment of cp-Ti reduces the content of hyd...
متن کاملEtching with Hydrofluoric Acid
Photoresists, wafers, plating solutions, etchants and solvents ... Phone: +49 731 977343 0 www.microchemicals.eu [email protected] Etching of SiO2, Quartz, and Glasses with HF Hydrofluoric acid is the only etchant which attacks amorphous SiO2, quartz, or glasses at significant high etch rate. However, HF is not only a strong corrosive, but also highly toxic towards higher concentrations: ...
متن کاملHydrofluoric Acid Exposure
A 21-year-old male was admitted to the emergency department with bleeding skin burns. He had been exposed to 70% hydrofluoric acid (HF) through his nitrile hand gloves during an etching glass procedure at work. He had painful lesions, which included bleeding skin abrasions due to seconddegree burns on the first and second fingertips on the right hand, and white spots on the left first finger, w...
متن کاملEtching with Hydrofluoric Acid
Photoresists, developers, remover, adhesion promoters, etchants, and solvents ... Phone: +49 731 36080-409 www.microchemicals.eu e-Mail: [email protected] Etching of SiO2, Quartz, and Glasses with HF Hydrofluoric acid is the only etchant which attacks amorphous SiO2, quartz, or glasses at significant high etch rate. However, HF is not only a strong corrosive, but also highly toxic towards...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Metal Finishing Society of Japan
سال: 1970
ISSN: 1884-3395,0026-0614
DOI: 10.4139/sfj1950.21.189